The New PVD HI3-Technology: Latest

Transcrição

The New PVD HI3-Technology:
Latest Developments and Potential
for Coining Dies.
Technical Forum - World Money Fair 2015, Berlin
29th January 2015, Volker von der Heide, Oerlikon Metaplas GmbH
Oerlikon
The New Segment Surface Solutions
Segment
Manmade
Fibers
Segment
Drive
Systems
Segment
Vacuum
Segment
Surface
Solutions
Segment
Advanced
Technologies
Oerlikon Balzers + Sulzer Metco
Two pioneers under one roof
Sulzer Metaplas GmbH
Oerlikon Metaplas GmbH
Page 2
Volker von der Heide, Oerlikon Metaplas GmbH
The merger of Balzers and Metco will form a
global technology leader in surface solutions
Surface Solutions Segment
Transaction summary
Signing Jan. 30, 2014
THICK LAYER COATING
Thermal Spray
THIN FILM COATING
PVD
PECVD (PACVD)
NITRIDING
Plasma Nitriding
Closing June 2, 2014
Enterprise value of CHF 1 bn
Forms the
Surface Solutions Segment
Surface Solutions to become
largest Segment of Oerlikon
Group
Represents the latest step
in Oerlikon’s transformation
process
Positions the Group for long
term profitable growth
Page 3
PVD Technology
METAPLAS.DOMINO PVD technology platform
PVD coatings
- have a high surface hardness
- increase wear protection
- have high chemical resistance, a low tendency to stick and weld
- have an excellent layer adhesion.
PVD coatings on coining dies are used for many years now around the world.
PVD coatings substantially increase the lifetime of dies and quality of coins.
Page 4
PVD Technologies offered today
Innovative APA Arc Technology
High target utilisation
Low target cost
High deposition rate
High Ionization rate (up to 100%)
Excellent coating adhesion
Magnetron Sputter Technology
Page 5
HIPIMS Plasma
HiPIMS Sputtering Technology
Wide range of materials
Wide range of materials
Low deposition rate
Low deposition rate
Low Ionization rate (30-40%)
High Ionization rate (up to 90%)
Medium coating adhesion
Very good coating adhesion
Smooth coatings
Very smooth coatings
A New Innovative PVD Technology
HI3 Technology
High Ionization 3 (triple)
The Combination of three high ionization
processes has been developed.
Oerlikon Metaplas has developed and combined
3 technologies with high ionization:
AEGD: high ionized plasma etching process
APA Arc: high ionized arc coating process
HIPIMS: high ionized sputter coating process
Page 6
High Ionization in PVD Processes
A high ionization during the coating process is important because:
it is necessary for dense and very smooth coatings
better phase and composition control is possible
less defects within the coating are produced
a high coating adhesion can be achieved
Plasma of APA evaporator
This provides an excellent tool to design
coatings with required improved properties
Page 7
HI3 Technology
For the first time, process and material combinations can be applied, that offer
completely new opportunities for high performance PVD coatings.
Combined strengths of 3 processes in one PVD system
Innovative approach to the next generation of PVD coatings for various applications
HI3 Technology allows to achieve layer architectures that could not be realized
previously by standard technologies.
Page 8
Arc specific
materials:
Magnetron materials:
Si, VX, B4C …
(Me1Me2Me3X)
top layers on
APA Arc coating
- CrX
- TiX
- AlTiX
- AlCrX
- AlTiCrX
-…….
doping/
nanolayers
HiPIMS module
APA Arc module
Anode of AEGD etching module
Page 9
First HI3 Coatings have been developed:
1. APA Arc AlTiN + HiPIMS AlTiSiXN
H = 2504 , E(0.3) = 400 GPa
HiPIMS: AlTiSiXN
HiPIMS: AlTiSiXN
+
APA ARC: AlTiN
APA ARC: AlTiN
First cutting tests showed potential in cutting of stainless steel.
However, we are looking for more tailored coatings not only for cutting tools.
Page 10
2. APA Arc AlTiN + HiPIMS VXN
H= 2297 +/-109, E(0.3) = 419 GPa
HiPIMS: VXN
H= 2824 +/-131, E(0.3) = 408 GPa
Hardness 2775 +/-40, E(0.3) = 345 GPa
HiPIMS: VXN
+
APA ARC: AlTiN
APA ARC: AlTiN
First promising results for taps, stamping and small forming tools.
However, we are looking for more tailored coatings also for other for tools.
Page 11
3. APA Arc AlTiN + HiPIMS SiBCN
HiPIMS
1 µm
SIBONICA
SiBNC: amorphous
micro hardness: 20
GPa
E-Modulus: 250 GPa
Arc + HiPIMS
3 µm
AlTiN/SiBNC:
fine columnar
micro hardness: 28 GPa
E-Modulus: 350 GPa
Arc
2 µm
AlTiN: columnar
micro hardness: 27 GPa
E-Modulus: 300 GPa
SiB based coatings have the highest scientific published oxidation resistance.
The alloying with SiB results in a grain refinement of the AlTiN.
Page 12
Summary
HI3 Technology combines the strengths of 3 processes in one PVD system:
excellent adhesion, high deposition rate, smooth coatings, economic production
Innovative approach to the next generation of PVD coatings for various applications.
First developed HI3 coatings show promising results for a wide range of application.
With HI3 Technology coatings for coining dies can be tailored
by a wide range of materials
by micro alloying
by doping
by design of layer architecture
…..combined with economical production!
HI3 Technology has great potential for improvement according to the needs of coining
applications: for circulation coining dies and for proof coining dies.
Your are welcome to start testing and improving with us
to the best suitable coating for your coining application.
Page 13
References
17 Oerlikon Metaplas PVD coating systems
have been installed at mints worldwide:
Royal Canadian Mint
Shanghai Mint, China
Shenyang Mint, China
Casa de Moneda, Mexico
Mint of Finland,
Nanjing Mint, China
Royal Thai Mint, Thailand
Venezuela Mint
Noida Mint, India
Ukraine Mint
Page 14
Chengdu Mint, China
Thank you.
Page 15

The New PVD HI3-Technology: Latest

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